Patents Honors

At the forefront of semiconductor innovation, Jingsheng has consistently advanced silicon ingot technology, earning numerous patents and prestigious recognitions. Our patented technologies include high-purity crystal growth processes, which significantly improve wafer uniformity and reduce defects, ensuring superior quality for advanced semiconductor applications. Proprietary innovations in Czochralski (CZ) and Float Zone (FZ) growth techniques allow precise thermal control and dislocation-free crystal formation, setting industry benchmarks for reliability and efficiency.

Jingsheng’s commitment to energy-efficient and automated silicon ingot production has also been recognized with multiple national and international awards. These honors include accolades for sustainable production methods, cutting-edge furnace designs, and AI-driven process optimization, reflecting our dedication to integrating technology with environmental responsibility.

Our intellectual property portfolio is a testament to our continuous pursuit of excellence, protecting innovations that enhance yield, scalability, and process stability. These patents not only reinforce Jingsheng’s position as a leader in semiconductor manufacturing technology but also demonstrate our unwavering commitment to advancing the industry while maintaining the highest standards of quality, safety, and sustainability.

Through these achievements, Jingsheng exemplifies a culture of innovation, integrity, and recognition, ensuring that our technological breakthroughs translate into tangible value for customers, partners, and the global semiconductor ecosystem.